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Proceedings Paper

Femtosecond optical curing of SU-8 photoresist
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Paper Abstract

SU-8 photoresist has been applied to three-dimensional (3D) patterning of photonics, micro/nanoelectromechanical systems and microfluidics. SU-8 photoresist can be patterned by absorption of ultraviolet radiation using a photomask; however, diffraction effects in the bulk resist and the use of a 2D mask limits complex 3D structure design. Direct laser writing (DLW) using multiphoton absorption can produce complex, sub-diffraction limited structures in the resist, but controlling DLW in SU-8 is complicated by many competing processes. Using 100 fs pulses at 1.7 μm, we reliably develop SU-8 photoresist via femtosecond optical curing on glass substrate and avoid competition from two, three, and four photon absorption processes. We verify optical curing of the resist by developing the resist without a post-bake.

Paper Details

Date Published: 28 February 2020
PDF: 7 pages
Proc. SPIE 11292, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII, 112921H (28 February 2020); doi: 10.1117/12.2545202
Show Author Affiliations
Christopher B. Marble, Texas A&M Univ. (United States)
Kassie S. Marble, Texas A&M Univ. (United States)
Vladislav V. Yakovlev, Texas A&M Univ. (United States)


Published in SPIE Proceedings Vol. 11292:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII
Georg von Freymann; Eva Blasco; Debashis Chanda, Editor(s)

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