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Proceedings Paper

Investigation of laser-matter interaction in transparent multilayer thin films (Conference Presentation)

Paper Abstract

Multilayer dielectric materials are used to tailor the optical properties of interfaces. While laser damage resistant coatings have been carefully investigated, the potential of laser modifications in staked alternating dielectric layers has not been explored thoroughly. Here, we investigate the effects of ultrafast laser exposure on alternating stacks of SiO2 and SiNx dielectric films deposited on a substrate, focusing primarily on non-ablative exposure and on its effect on the layer intermixing and the resultant change of material properties. We are especially interested on the experimental characterization of the materials after femtosecond laser exposure, particularly on the post-exposure material structure.

Paper Details

Date Published: 9 March 2020
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Proc. SPIE 11270, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XX, 112700F (9 March 2020); doi: 10.1117/12.2545056
Show Author Affiliations
Ruben Ricca, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Yves Bellouard, Ecole Polytechnique Fédérale de Lausanne (Switzerland)


Published in SPIE Proceedings Vol. 11270:
Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XX
Peter R. Herman; Michel Meunier; Roberto Osellame, Editor(s)

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