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Proceedings Paper

High LIDT photosensitive organic-inorganic hybrid materials for nanoimprint lithography (Conference Presentation)
Author(s): Maria Farsari; Areti Mourka; Vasileia Melissinaki; Dimitris G. Papazoglou; Theodoros Tachtsidis; Andrius Melninkaitis

Paper Abstract

Nanoimprint lithography (NIL) is a technique suitable for the mass production of micro-optical elements using a mould. One drawback, however, is that the materials used in NIL have low laser-induced damage threshold (LIDT). Here, we present our results in the development of a series of high-LIDT organic-inorganic hybrid materials, and their application in NIL using moulds made by multiphoton lithography.

Paper Details

Date Published: 9 March 2020
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Proc. SPIE 11269, Synthesis and Photonics of Nanoscale Materials XVII, 112690A (9 March 2020); doi: 10.1117/12.2544705
Show Author Affiliations
Maria Farsari, Foundation for Research and Technology-Hellas (Greece)
Areti Mourka, Foundation for Research and Technology-Hellas (Greece)
Vasileia Melissinaki, Foundation for Research and Technology-Hellas (Greece)
Dimitris G. Papazoglou, Foundation for Research and Technology-Hellas (Greece)
Theodoros Tachtsidis, Nanotypos (Greece)
Andrius Melninkaitis, Vilnius Univ. (Lithuania)


Published in SPIE Proceedings Vol. 11269:
Synthesis and Photonics of Nanoscale Materials XVII
Jan J. Dubowski; David B. Geohegan; Andrei V. Kabashin, Editor(s)

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