Proceedings Paper
High LIDT photosensitive organic-inorganic hybrid materials for nanoimprint lithography (Conference Presentation)
Paper Abstract
Nanoimprint lithography (NIL) is a technique suitable for the mass production of micro-optical elements using a mould. One drawback, however, is that the materials used in NIL have low laser-induced damage threshold (LIDT). Here, we present our results in the development of a series of high-LIDT organic-inorganic hybrid materials, and their application in NIL using moulds made by multiphoton lithography.
Paper Details
Date Published: 9 March 2020
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Proc. SPIE 11269, Synthesis and Photonics of Nanoscale Materials XVII, 112690A (9 March 2020); doi: 10.1117/12.2544705
Published in SPIE Proceedings Vol. 11269:
Synthesis and Photonics of Nanoscale Materials XVII
Jan J. Dubowski; David B. Geohegan; Andrei V. Kabashin, Editor(s)
Proc. SPIE 11269, Synthesis and Photonics of Nanoscale Materials XVII, 112690A (9 March 2020); doi: 10.1117/12.2544705
Show Author Affiliations
Maria Farsari, Foundation for Research and Technology-Hellas (Greece)
Areti Mourka, Foundation for Research and Technology-Hellas (Greece)
Vasileia Melissinaki, Foundation for Research and Technology-Hellas (Greece)
Areti Mourka, Foundation for Research and Technology-Hellas (Greece)
Vasileia Melissinaki, Foundation for Research and Technology-Hellas (Greece)
Dimitris G. Papazoglou, Foundation for Research and Technology-Hellas (Greece)
Theodoros Tachtsidis, Nanotypos (Greece)
Andrius Melninkaitis, Vilnius Univ. (Lithuania)
Theodoros Tachtsidis, Nanotypos (Greece)
Andrius Melninkaitis, Vilnius Univ. (Lithuania)
Published in SPIE Proceedings Vol. 11269:
Synthesis and Photonics of Nanoscale Materials XVII
Jan J. Dubowski; David B. Geohegan; Andrei V. Kabashin, Editor(s)
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