
Proceedings Paper
New generation magnetorheological finishing polishing machines using robot armFormat | Member Price | Non-Member Price |
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Paper Abstract
Magnetorheological Finishing (MRF) is widely regarded as an effective means of processing aspheric optical components. We developed a MRF polishing machine based on a robot arm. Compared to the traditional MRF polishing machines, our new generation machines are more flexible, cost-effective and efficient. The basic components of were introduced and the calculating angle was transformed. We processed a flat SiC mirror and the final accuracy is 0.012λ.
Paper Details
Date Published: 18 December 2019
PDF: 4 pages
Proc. SPIE 11341, AOPC 2019: Space Optics, Telescopes, and Instrumentation, 1134118 (18 December 2019); doi: 10.1117/12.2544325
Published in SPIE Proceedings Vol. 11341:
AOPC 2019: Space Optics, Telescopes, and Instrumentation
Suijian Xue; Xuejun Zhang; Carl Anthony Nardell; Ziyang Zhang, Editor(s)
PDF: 4 pages
Proc. SPIE 11341, AOPC 2019: Space Optics, Telescopes, and Instrumentation, 1134118 (18 December 2019); doi: 10.1117/12.2544325
Show Author Affiliations
Longxiang Li, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jianwei Zhang, Univ. of California, Los Angeles (United States)
Chi Song, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jianwei Zhang, Univ. of California, Los Angeles (United States)
Chi Song, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xin Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xiaolin Yin, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Donglin Xue, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xiaolin Yin, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Donglin Xue, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Published in SPIE Proceedings Vol. 11341:
AOPC 2019: Space Optics, Telescopes, and Instrumentation
Suijian Xue; Xuejun Zhang; Carl Anthony Nardell; Ziyang Zhang, Editor(s)
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