Share Email Print
cover

Proceedings Paper

The manufacture of depolarizer in transform system of immersion photolithography polarization state
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

To meet the requirements of 45nm node ultraviolet lithography exposure optical system with 193nm wavelength and 1.35 NA for high resolution in extremely large scale integrated circuit. A depolarizer is designed to implement high quality polarization mode lighting on mask surface. In this paper, the depolarizer in the polarization transformation module is designed and the AR film in the depolarizer is developed, combination of two wedge shaped quartz crystals with a diameter of 50±0.2mm is used to realize beam depolarization, with optical axes of two crystals are at an angle of 45 degrees in space. The front one achieves depolarization and the back one compensates optical path. The reflectivity of the prepared AR film is less than 99.5% at 193nm, this depolarizer solved a series of problems caused by the sharp reduction of focal depth due to the increase of NA and the shortening of exposure wavelength, therefore, the development of this depolarizer has certain application value.

Paper Details

Date Published: 18 December 2019
PDF: 6 pages
Proc. SPIE 11334, AOPC 2019: Optoelectronic Devices and Integration; and Terahertz Technology and Applications, 113340T (18 December 2019); doi: 10.1117/12.2544163
Show Author Affiliations
Mei-Xuan Li, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Hong Li, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Si-Qi Zhang, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Ming Guo, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)


Published in SPIE Proceedings Vol. 11334:
AOPC 2019: Optoelectronic Devices and Integration; and Terahertz Technology and Applications
Zhiping Zhou; Xiao-Cong Yuan; Daoxin Dai, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray