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Proceedings Paper

Wavelength influence on the determination of subwavelength grating parameters by using optical scatterometry
Author(s): Lauryna Siaudinyte; Silvania F. Pereira
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Paper Abstract

The paper represents a comparison of simulated light scattering of the near and far fields of subwavelength grating at various wavelengths. By quantifying and comparing the scattered near and far fields of multiple grating parameters to the nominal parameter based scattered field, the sensitivity to the change of grating parameters is determined. The wavelength influence on the near field is analyzed by applying a plane wave at certain angle of incidence and the far field diffraction patterns are simulated by applying coherent focused light (conical incidence). The paper analyses how each wavelength affects the sensitivity to the change of the height and the sidewall angle of a subwavelength grating.

Paper Details

Date Published: 20 March 2020
PDF: 7 pages
Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113252M (20 March 2020); doi: 10.1117/12.2544156
Show Author Affiliations
Lauryna Siaudinyte, Delft Univ. of Technology (Netherlands)
Silvania F. Pereira, Delft Univ. of Technology (Netherlands)

Published in SPIE Proceedings Vol. 11325:
Metrology, Inspection, and Process Control for Microlithography XXXIV
Ofer Adan; John C. Robinson, Editor(s)

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