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Effect of working conditions on bulk resistance of micro-channel plate
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Paper Abstract

Micro-channel plate is an electronic multiplier element with two-dimensional hollow glass tube array structure, which has been widely used in low-light-level night vision imaging, particle detection and other devices. Bulk resistance of microchannel plate is an important performance index, which affects the electronic multiplication performance, dynamic response range and time resolution of micro-channel plate. There are many literatures about the influence of the preparation process of microchannel plate on bulk resistance, but few reports about the influence of the working conditions of microchannel plate on bulk resistance. In this paper, we mainly study the influence of micro-channel plate voltage and ambient temperature on bulk resistance, and analyze the mechanism of the change by tunneling. The results show that: 1) The change of working conditions leads to the change of the bulk resistance of the micro-channel plate. The higher the temperature and the voltage of the micro-channel plate, the lower the bulk resistance of micro-channel plate. The larger the original bulk resistance, the smaller the change rate of the micro-channel plate is. 2) The phenomenon that the resistance of micro-channel plate varies with the use conditions conforms to the mechanism of tunneling conduction.

Paper Details

Date Published: 18 December 2019
PDF: 7 pages
Proc. SPIE 11338, AOPC 2019: Optical Sensing and Imaging Technology, 113381G (18 December 2019); doi: 10.1117/12.2543915
Show Author Affiliations
Yonggang Huang, China Building Materials Academy (China)
Peng Jiao, China Building Materials Academy (China)
Pan Shi, China Building Materials Academy (China)
Yun Wang, China Building Materials Academy (China)
You Zhou, China Building Materials Academy (China)
Yang Fu, China Building Materials Academy (China)
Jiuwang Wang, China Building Materials Academy (China)
Jinsheng Jia, China Building Materials Academy (China)


Published in SPIE Proceedings Vol. 11338:
AOPC 2019: Optical Sensing and Imaging Technology
John E. Greivenkamp; Jun Tanida; Yadong Jiang; HaiMei Gong; Jin Lu; Dong Liu, Editor(s)

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