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Proceedings Paper

Novel CMOS-integrated 512x320 tip-tilt micro mirror array and related technology platform
Author(s): A. Gehner; S. Döring; D. Rudloff; D. Kunze; P. Dürr; S. Francés; L. Hänsel; H. Torlee; A. Elgner; M. Eckert; M. Friedrichs; J. Heber; J. Schmidt; W. Pufe; C. Hohle; M. Schulze; M. Wagner
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Paper Abstract

We developed a novel 512 x 320 tip-tilt micro mirror array (MMA) together with the entire related technology platform, including mirror fabrication process, integrated CMOS address circuitry and external drive electronics. The MMA itself consists of 2axis-tip-tilt actuators at 48μm pixel size, allowing a continuous pure tip-tilt motion up to 3.5° in arbitrary directions, fully calibratable at standard deviations of better than 0.025°. The mirrors are realized within a 2-level architecture defined by three structural layers, two for hinge and reinforcement suspension and one for the overlying mirror. They are fabricated by surface-micromachining within a fully CMOS compatible process. MMA programming is accomplished by an underlying CMOS backplane supporting drive voltages up to 27V and frame rates up to 3.6kHz.

Paper Details

Date Published: 28 February 2020
PDF: 10 pages
Proc. SPIE 11293, MOEMS and Miniaturized Systems XIX, 1129302 (28 February 2020); doi: 10.1117/12.2543052
Show Author Affiliations
A. Gehner, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
S. Döring, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
D. Rudloff, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
D. Kunze, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
P. Dürr, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
S. Francés, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
L. Hänsel, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
H. Torlee, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
A. Elgner, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
M. Eckert, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
M. Friedrichs, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
J. Heber, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
J. Schmidt, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
W. Pufe, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
C. Hohle, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
M. Schulze, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)
M. Wagner, Fraunhofer Institute for Photonic Microsystems, IPMS (Germany)


Published in SPIE Proceedings Vol. 11293:
MOEMS and Miniaturized Systems XIX
Wibool Piyawattanametha; Yong-Hwa Park; Hans Zappe, Editor(s)

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