
Proceedings Paper
Effect of spot size on laser damage single crystal siliconFormat | Member Price | Non-Member Price |
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Paper Abstract
Spot size is an important factor affecting the interaction between laser and single crystal silicon. Different radius millisecond pulsed laser is used to irradiate single crystal silicon. The effects of laser irradiation on large and small spot size, including temperature rise, damage area and damage morphology, are compared and analyzed. The influence rule of spot size on laser-induced single crystal silicon is determined and its mechanism is analyzed. The results show that the peak temperature of the laser irradiation center point is higher when the spot radius is 0.2 cm than when the spot radius is 0.1 cm; the damage area of single crystal silicon increases with the increase of laser energy density; the damage threshold decreases with the increase of laser spot size, and increases with the increase of pulse width.
Paper Details
Date Published: 18 December 2019
PDF: 6 pages
Proc. SPIE 11333, AOPC 2019: Advanced Laser Materials and Laser Technology, 113330L (18 December 2019); doi: 10.1117/12.2542958
Published in SPIE Proceedings Vol. 11333:
AOPC 2019: Advanced Laser Materials and Laser Technology
Pu Zhou; Jian Zhang; Wenxue Li; Shibin Jiang; Takunori Taira, Editor(s)
PDF: 6 pages
Proc. SPIE 11333, AOPC 2019: Advanced Laser Materials and Laser Technology, 113330L (18 December 2019); doi: 10.1117/12.2542958
Show Author Affiliations
Ming Guo, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Yongxiang Zhang, Changchun Univ. of Science and Technology (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Yongxiang Zhang, Changchun Univ. of Science and Technology (China)
Wenying Zhang, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Hong Li, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Hong Li, Jilin Engineering Normal Univ. (China)
Jilin Engineering Lab. for Quantum Information Technology (China)
Published in SPIE Proceedings Vol. 11333:
AOPC 2019: Advanced Laser Materials and Laser Technology
Pu Zhou; Jian Zhang; Wenxue Li; Shibin Jiang; Takunori Taira, Editor(s)
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