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Proceedings Paper

Ion beam figuring with using Einzel lens
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Paper Abstract

Ion Beam Figuring (IBF) has been used for nearly 20 years by several laboratories and companies as a highly deterministic method of final processing of ultra-precision optical elements. Nowadays, requirements for high precision optics demand to have full control over the ion beam, which includes both the ion beam profile and intensity. Electrostatic focusing using an Einzel lens setup provides a simple option to control the ion beam shape by changing voltage. This experimental study investigates the early stage development of an Einzel lens used to control an RF40 ion source. First results demonstrate the possibility to use an Einzel lens to control the ion beam profile and indicate possible future challenges this technology has to overcome when used in IBF machines.

Paper Details

Date Published: 30 December 2019
PDF: 8 pages
Proc. SPIE 11385, Optics and Measurement International Conference 2019, 1138508 (30 December 2019); doi: 10.1117/12.2542822
Show Author Affiliations
Vasyl Karabyn, Institute of Plasma Physics of the CAS, v.v.i. (Czech Republic)
Jaroslav Polák, Institute of Plasma Physics of the CAS, v.v.i. (Czech Republic)
František Procháska, Institute of Plasma Physics of the CAS, v.v.i. (Czech Republic)
Radek Melich, Institute of Plasma Physics of the CAS, v.v.i. (Czech Republic)


Published in SPIE Proceedings Vol. 11385:
Optics and Measurement International Conference 2019
Jana Kovačičinová, Editor(s)

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