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Proceedings Paper

Multiline oscillation of Q-switched cavity-dumped CO2 laser with intracavity diffraction grating
Author(s): Yuzuru Tadokoro; Tatsuya Yamamoto; Junichi Nishimae
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Paper Abstract

Extreme-ultraviolet (EUV) lithography employs a high-power short-pulse carbon dioxide (CO2) laser based on master oscillator power amplifier architecture to produce Sn plasma generating the EUV light. We demonstrate multiline oscillation of a CO2 laser with 20 ns of pulse duration for the master oscillator. An intracavity diffraction grating enables the 5-line oscillation (10.55, 10.57, 10.59, 10.61, and 10.63 μm) by separating the different 5 lines spatially in a gasdischarge gain medium. The multiline CO2 laser employs a cavity length of 3000 mm and an electro-optically Q-switched cavity dumping to generate 20-ns laser pulses. The maximum output power is 10.6 W at 100-kHz repetition rate and the output stability is ±1.2% at 3σ over 30 minutes. The grating combines the separated 5 optical axes into one optical axis inside the cavity, which realizes the nearly single-mode (TEM00) oscillation with ~1.1 of M2.

Paper Details

Date Published: 2 March 2020
PDF: 6 pages
Proc. SPIE 11266, Laser Resonators, Microresonators, and Beam Control XXII, 1126613 (2 March 2020); doi: 10.1117/12.2542631
Show Author Affiliations
Yuzuru Tadokoro, Mitsubishi Electric Corp. (Japan)
Tatsuya Yamamoto, Mitsubishi Electric Corp. (Japan)
Junichi Nishimae, Mitsubishi Electric Corp. (Japan)

Published in SPIE Proceedings Vol. 11266:
Laser Resonators, Microresonators, and Beam Control XXII
Alexis V. Kudryashov; Alan H. Paxton; Vladimir S. Ilchenko; Andrea M. Armani, Editor(s)

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