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Proceedings Paper

OPO residuals reduction with imaging metrology color per layer mode
Author(s): Shlomit Katz; Honggoo Lee; Dongyoung Lee; Jinsoo Kim; Jaesun Woo; Chunsoo Kang; Chanha Park; Dohwa Lee; Seongjae Lee; Sanghuck Jeon; Dongsub Choi; Anna Golotsvan; Roie Volkivich; Efi Megged
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Paper Abstract

As the semiconductor industry rapidly approaches the 3nm lithography node, on product overlay (OPO) requirements have become tighter and as a result, residuals magnitude requirements have become even more challenging. Metrology performance enhancements are required to meet these demands. Color Per Layer (CPL) is a unique imaging overlay metrology approach that enables the measurement of each layer with individually-optimized wavelength and focus position. CPL allows the user to custom-define the most suitable conditions per layer, thereby ensuring optimal performance. Imaging-based overlay (IBO) utilizes CPL in order to overcome inaccuracies due to interactions between bottom and top layers. These layers are fundamentally different in that the top grating is usually the photoresist layer, but the bottom grating can be any process layer. Therefore, optimizing the conditions for each layer will maximize measurement accuracy. KLA’s Archer™ 700 metrology tool addresses these metrology challenges by putting CPL to use, where the Wave Tuner (WT) allows the user to select a specific wavelength. This paper presents this novel CPL approach and discusses its reduction in OPO and contrast, and reviews use cases from DRAM and 3D NAND. We will present the results from these case studies, focusing on SK Hynix DRAM production wafers.

Paper Details

Date Published: 20 March 2020
PDF: 8 pages
Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113252E (20 March 2020); doi: 10.1117/12.2541933
Show Author Affiliations
Shlomit Katz, KLA Corp. Israel (Israel)
Honggoo Lee, SK Hynix (Korea, Republic of)
Dongyoung Lee, SK Hynix (Korea, Republic of)
Jinsoo Kim, SK Hynix (Korea, Republic of)
Jaesun Woo, SK Hynix (Korea, Republic of)
Chunsoo Kang, SK Hynix (Korea, Republic of)
Chanha Park, SK Hynix (Korea, Republic of)
Dohwa Lee, KLA Corp. Korea (Korea, Republic of)
Seongjae Lee, KLA Corp. Korea (Korea, Republic of)
Sanghuck Jeon, KLA Corp. Korea (Korea, Republic of)
Dongsub Choi, KLA Corp. Korea (Korea, Republic of)
Anna Golotsvan, KLA Corp. Israel (Israel)
Roie Volkivich, KLA Corp. Israel (Israel)
Efi Megged, KLA Corp. Israel (Israel)


Published in SPIE Proceedings Vol. 11325:
Metrology, Inspection, and Process Control for Microlithography XXXIV
Ofer Adan; John C. Robinson, Editor(s)

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