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Optimal analysis of trajectory parameters for the double-sided polishing in planetary motion mode
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Paper Abstract

Based on the processing mechanism of double-sided polishing machine and working mode, conducted intensive research, found that the motion state of the disc and pads can be simplified as a workpiece relative motion, and a complete mathematical model is built for the motion state of any point on the polishing disc. In view of the relationship among the workpiece’s motion characteristics, polishing process parameters and polishing effect, the computer is used to simulate the motion of the polishing disc relative to the workpiece in the state of steady motion. Taking the motion parameters as the control factor, by changing the ratio of different parameters, the different trajectory of the workpiece’s relative motion is obtained, and the regular pattern of the value of each factor on the motion trajectory distribution is explored. Finally, a set of parameters with the best grinding track uniformity and polishing effect were obtained through analysis and summary.

Paper Details

Date Published: 16 October 2019
PDF: 7 pages
Proc. SPIE 11205, Seventh International Conference on Optical and Photonic Engineering (icOPEN 2019), 112051T (16 October 2019); doi: 10.1117/12.2541653
Show Author Affiliations
Chenchen Li D.D.S., Changchun Univ. of Science and Technology (China)
Chunyang Wang, Changchun Univ. of Science and Technology (China)
Xi'an Technological Univ. (China)
Dasen Wa, Inner Mongolia Institute of Metal Materials (China)
Hongwei Shi, Changchun Univ. of Science and Technology (China)
Xi'an Technological Univ. (China)


Published in SPIE Proceedings Vol. 11205:
Seventh International Conference on Optical and Photonic Engineering (icOPEN 2019)
Anand Asundi; Motoharu Fujigaki; Huimin Xie; Qican Zhang; Song Zhang; Jianguo Zhu; Qian Kemao, Editor(s)

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