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Antireflective surfaces for astro-photonic applications
Author(s): Daniel Smith; Nguyen Hoai An Le; Soon Hock Ng; Saulius Juodkazis
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Paper Abstract

Antireflection patterns for optical elements used in astro-photonic applications require optimisation for different wavelengths, a defined angular selectivity and have to be made on large curved surfaces. Sputtered film of tens-of-nm of gold was annealed at 500°C for 1 hour to form a pattern of nano-islands used as a mask for plasma etching. Separation between islands depended on the annealing time and an initial film thickness and provides a method to control a characteristic length between etched nano-pillars. Fabricated surfaces were characterised by transmission and reflection spectroscopy.

Paper Details

Date Published: 31 December 2019
PDF: 2 pages
Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011G (31 December 2019); doi: 10.1117/12.2541313
Show Author Affiliations
Daniel Smith, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrications (Australia)
Nguyen Hoai An Le, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Soon Hock Ng, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)


Published in SPIE Proceedings Vol. 11201:
SPIE Micro + Nano Materials, Devices, and Applications 2019
M. Cather Simpson; Saulius Juodkazis, Editor(s)

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