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CMOS-compatible, plasma beam assisted reactive magnetron sputtered silicon nitride films for photonic integrated circuits
Author(s): Andreas Frigg; Andreas Boes; Guanghui Ren; Duk-Yong Choi; Silvio Gees; Arnan Mitchell
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Paper Abstract

In this contribution, we demonstrate the deposition of low loss, CMOS-compatible SiN thin-films using plasma beam assisted reactive sputtering for photonic integrated circuits. Plasma beam assistance during the deposition process enabled us to achieve thin-film losses of below 0.1 dB/cm and a surface roughness of Rq of <0.1 nm, while keeping the processing temperatures below 400°C. Propagation losses of 0.9 dB/cm at 1550 nm have been achieved for waveguides with a cross section of 460× 2000 nm (height × width).

Paper Details

Date Published: 30 December 2019
PDF: 2 pages
Proc. SPIE 11200, AOS Australian Conference on Optical Fibre Technology (ACOFT) and Australian Conference on Optics, Lasers, and Spectroscopy (ACOLS) 2019, 112001T (30 December 2019); doi: 10.1117/12.2541269
Show Author Affiliations
Andreas Frigg, RMIT Univ. (Australia)
Andreas Boes, RMIT Univ. (Australia)
Guanghui Ren, RMIT Univ. (Australia)
Duk-Yong Choi, The Australian National Univ. (Australia)
Silvio Gees, Evatec Ltd. (Switzerland)
Arnan Mitchell, RMIT Univ. (Australia)


Published in SPIE Proceedings Vol. 11200:
AOS Australian Conference on Optical Fibre Technology (ACOFT) and Australian Conference on Optics, Lasers, and Spectroscopy (ACOLS) 2019
Arnan Mitchell; Halina Rubinsztein-Dunlop, Editor(s)

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