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Silicon-based metasurfaces for vortex beam generation
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Paper Abstract

Silicon metasurfaces were fabricated on fused silica substrates by using sputtering, electron beam lithography and reactive ion etching. A chromium etch mask was used to protect the silicon during plasma etching. We designed a hologram with phase range of 0 - 1.17π to generate a higher order Bessel beam. The device produced the expected beam profile and the presence of charge 3 was confirmed using a interference test. Tests on spiral plate devices were less successful owing to the thickness non-uniformity in the sputtered Si film.

Paper Details

Date Published: 31 December 2019
PDF: 3 pages
Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011T (31 December 2019); doi: 10.1117/12.2541234
Show Author Affiliations
Raghu Dharmavarapu, Indian Institute of Technology Madras (India)
Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Soon Hock Ng, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Shanti Bhattacharya, Indian Institute of Technology Madras (India)
Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)


Published in SPIE Proceedings Vol. 11201:
SPIE Micro + Nano Materials, Devices, and Applications 2019
M. Cather Simpson; Saulius Juodkazis, Editor(s)

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