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Proceedings Paper

Large-area mask patterning for solar cell applications
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Paper Abstract

Light harvesting using photonic crystal (PhC) surface patterns provides an opportunity to surpass the ray-optics defined light trapping and to approach thermodynamic ShockleyQueisser limit of solar cell efficiency, which for a single junction Si solar cell is ~ 32%. For an industry amenable nano-patterning of Si solar cells, we used laser direct write and stepper lithography based approaches for defining a large area (1 cm2) light trapping PhC patterns on silicon. Nanoholes of ~ 500 nm in diameter were fabricated by direct laser writing in a thin layer of chromium to act as a mask for subsequent reactive plasma etching to fabricate the nanostructures forming a PhC surface over a square centimeter. Surface area fabrication throughput was improved by more than order of magnitude as compared with electron beam lithography required to achieve sub-1 μm resolution.

Paper Details

Date Published: 31 December 2019
PDF: 3 pages
Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011K (31 December 2019); doi: 10.1117/12.2541103
Show Author Affiliations
Jingwen Hu, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Jovan Maksimovic, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Soon Hock Ng, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Stefan Lundgaard, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Yoshiaki Nishijima, Yokohama National Univ. (Japan)
Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
Melbourne Ctr. for Nanofabrication (Australia)
Yokohama National Univ. (Japan)


Published in SPIE Proceedings Vol. 11201:
SPIE Micro + Nano Materials, Devices, and Applications 2019
M. Cather Simpson; Saulius Juodkazis, Editor(s)

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