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Design of CMOS compatible plasmonic color filter for high selectivity
Author(s): Ayesha Shaukat; Khalid Arif
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Paper Abstract

In this paper a theoretical study of highly selective plasmonic color filters is demonstrated. The filter design consist of a perforated aluminium film, where nanoholes are arranged in a square lattice. A hybrid substrate is implemented as a dielectric layer which allows high selectivity and minimum spectral cross talk. The impact of the hole periodicity, thicknesses of Si3N4 and metallic layer on the device performance is highlighted. The optical resonance transmission properties of the simulated plasmonic color filter including resonance position, transmission efficiency, figure of merit, and spectral bandwidth of resonance peak are also analyzed thoroughly.

Paper Details

Date Published: 30 December 2019
PDF: 3 pages
Proc. SPIE 11200, AOS Australian Conference on Optical Fibre Technology (ACOFT) and Australian Conference on Optics, Lasers, and Spectroscopy (ACOLS) 2019, 112002O (30 December 2019); doi: 10.1117/12.2539266
Show Author Affiliations
Ayesha Shaukat, Massey Univ. (New Zealand)
Khalid Arif, Massey Univ. (New Zealand)


Published in SPIE Proceedings Vol. 11200:
AOS Australian Conference on Optical Fibre Technology (ACOFT) and Australian Conference on Optics, Lasers, and Spectroscopy (ACOLS) 2019
Arnan Mitchell; Halina Rubinsztein-Dunlop, Editor(s)

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