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Scalable and consistent fabrication of plasmonic colors via nanoimprint lithography
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Paper Abstract

We utilised thermal and UV-assisted Nanoimprint Lithography (NIL) i.e. thermal and UV-assisted to produce plasmonic coloration, and compare their ability for scalable fabrication. Several designs are presented and we show the generated colors are dependent on their geometry and the direction of polarisation of incident illumination. Finally, we demonstrated UV-NIL for consistent production of large-area (0.6×0.4 cm2) plasmonic color with extended color gamut.

Paper Details

Date Published: 31 December 2019
PDF: 2 pages
Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011J (31 December 2019); doi: 10.1117/12.2539079
Show Author Affiliations
M. Faris Shanin Shahidan, The Univ. of Melbourne (Australia)
Jingchao Song, The Univ. of Melbourne (Australia)
Timothy D. James, Reserve Bank of Australia (Australia)
Paul Mulvaney, The Univ. of Melbourne (Australia)
Ann Roberts, The Univ. of Melbourne (Australia)


Published in SPIE Proceedings Vol. 11201:
SPIE Micro + Nano Materials, Devices, and Applications 2019
M. Cather Simpson; Saulius Juodkazis, Editor(s)

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