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Proceedings Paper

Requirements of data technology for EUV photomask
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Paper Abstract

Data technology for data handling, correction, and verification has become the essential technology of photomask. By the shrinkage of device pitch and the development of lithography technology, the data volume of photomask has been increased continuously and the correction and verification technology based on design data has an important role to meet the target of patterning quality. Especially, because EUV lithography makes single patterning possible, the decrease of device pitch rises to the challenge on the data technology for EUV photomask. Furthermore, the multi-beam mask writer which enables dose modulation for each pixel requires fundamental changes such as data format, data flow, and correction algorithm. Here, we will discuss about 7 kinds of data technologies and one proposal for the era of EUV lithography.

Paper Details

Date Published: 26 September 2019
PDF: 16 pages
Proc. SPIE 11148, Photomask Technology 2019, 111480F (26 September 2019); doi: 10.1117/12.2538411
Show Author Affiliations
Jin Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jonggul Doh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Minah Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan Uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 11148:
Photomask Technology 2019
Jed H. Rankin; Moshe E. Preil, Editor(s)

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