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Proceedings Paper • Open Access

Lifetime test on EUV photomask with EBL2
Author(s): Chien-Ching Wu; Markus Bender; Rik Jonckheere; Frank Scholze; Herman Bekman; Michel van Putten; Rory de Zanger; Rob Ebeling; Jeroen Westerhout; Kyri Nicolai; Jacqueline van Veldhoven; Véronique de Rooij-Lohmann; Olaf Kievit; Alex Deutz

Paper Abstract

TNO has built EBL2, an EUV exposure facility equipped with an in vacuo X-ray photoelectron spectroscopy setup (XPS) and an in-situ ellipsometer. EBL2 enables lifetime testing of EUV optics, photomasks, pellicles and related components under development in relevant EUV scanner and source conditions, which was previously not available to industry. This lifetime testing can help the industry to prepare for high volume production using EUV lithography by bringing forward information about material behavior which facilitates the development cycle. This paper describes an EUV photomask lifetime test performed at EBL2. The mask was exposed to different EUV doses under a controlled gas and temperature environment. To investigate how EUV light interacts with the mask, various analysis techniques were applied before and after EUV exposure. In-situ XPS was used to investigate elemental compositions of the mask surface. An ex-situ critical dimension scanning electron microscope (CD-SEM) and an atomic force microscope (AFM) were used to explore the impact of EUV light on critical dimensions (CD) and feature profiles. In addition, EUV reflectometry (EUVR) was used to investigate the change of reflectivity after EUV exposures. The exposure conditions are reported, as well as an analysis of the effects observed.

Paper Details

Date Published: 27 June 2019
PDF: 6 pages
Proc. SPIE 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 111780E (27 June 2019); doi: 10.1117/12.2537734
Show Author Affiliations
Chien-Ching Wu, TNO (Netherlands)
Markus Bender, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
Rik Jonckheere, IMEC (Belgium)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Herman Bekman, TNO (Netherlands)
Michel van Putten, TNO (Netherlands)
Rory de Zanger, TNO (Netherlands)
Rob Ebeling, TNO (Netherlands)
Jeroen Westerhout, TNO (Netherlands)
Kyri Nicolai, TNO (Netherlands)
Jacqueline van Veldhoven, TNO (Netherlands)
Véronique de Rooij-Lohmann, TNO (Netherlands)
Olaf Kievit, TNO (Netherlands)
Alex Deutz, TNO (Netherlands)

Published in SPIE Proceedings Vol. 11178:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
Akihiko Ando, Editor(s)

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