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Particle on EUV pellicles, impact on LWR
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Paper Abstract

The EUV pellicle is a thin membrane intended to shield the reticle from particles. Any particles on the pellicle will be out of focus but large particles can still locally influence pattern formation. This work experimentally determines the local imaging influence dependence of particle size. A predictive model for CD change was formulated and validated. Furthermore, a linear relation between the change of CD vs. LWR was derived and found to be driven by the resist only. Therefore, the CD and LWR influence from a particle can be predicted, enabling meaningful specification limits for particle size from an imaging perspective.

Paper Details

Date Published: 9 October 2019
PDF: 14 pages
Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 111470S (9 October 2019); doi: 10.1117/12.2537103
Show Author Affiliations
Michiel Kupers, ASML Netherlands B.V. (Netherlands)
Gijsbert Rispens, ASML Netherlands B.V. (Netherlands)
Lokesh Devaraj, ASML Netherlands B.V. (Netherlands)
Gerardo Bottiglieri, ASML Netherlands B.V. (Netherlands)
Twan van den Hoogenhoff, ASML Netherlands B.V. (Netherlands)
Par Broman, ASML Netherlands B.V. (Netherlands)
Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)
Felix Wahlisch, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 11147:
International Conference on Extreme Ultraviolet Lithography 2019
Toshiro Itani; Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse, Editor(s)

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