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Proceedings Paper

Study of RLS trade-off mitigation utilizing a novel negative chemically amplified resist for high resolution patterning
Author(s): Satoshi Enomoto; Kohei Machida; Michiya Naito; Takahiro Kozawa
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Paper Abstract

The acid diffusion in chemically amplified resists (CARs) which are a current standard resist for semiconductor device manufacturing is a significant concern in the development of highly resolving resists. Thus, high resolution CARs are reduced the number of the acid catalytic reaction per acid by high amount of acid quencher to suppressed acid diffusion blur for remaining low line width roughness (LWR) number. Non-chemically amplified resists (non-CARs) are generally lower LWR than CARs. However, non-CARs are generally less sensitive to radiation than CARs due to lack of amplification mechanism. Recently, we proposed a negative-type resist utilizing non-CAR and CAR reactions on the same platform. This resist use radiation induced non-catalitic reactions which are polarity change of onium decomposition and radical crosslinking of radiation decomposed monomers. And also, the resist uses an acid catalytic etherification utilizing diphenyl methanol derivative and aliphatic alcohol. These combination reaction by non-CARs and CAR are expected to contribute the sensitivity improvement for high resolution resist. The synthesized resists were composed of triarylsulfonium cations as a polarity changer and radical generator, 2,2,2-trisubstituted acetophenone as a radical generator, triphenyl(4-vinylphenyl)stannane (TPSnSt) as an EUV absorption enhancer and a quencher, and 4- [(2,4-Dimethoxyphenyl)hydroxymethyl]phenylmethacrylate (ARMA) as a polymer-bound acid-reactive unit. As the result, a 25 nm HP pattern could be obtained with 2.1 nm LWR and at 160 μC/cm2.

Paper Details

Date Published: 26 September 2019
PDF: 6 pages
Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 111471K (26 September 2019); doi: 10.1117/12.2536909
Show Author Affiliations
Satoshi Enomoto, Toyo Gosei Co., Ltd. (Japan)
Kohei Machida, Toyo Gosei Co., Ltd. (Japan)
Michiya Naito, Toyo Gosei Co., Ltd. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 11147:
International Conference on Extreme Ultraviolet Lithography 2019
Toshiro Itani; Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse, Editor(s)

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