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Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces
Author(s): Lukas Bahrenberg; Sven Glabisch; Moein Ghafoori; Sascha Brose; Serhiy Danylyuk; Jochen Stollenwerk; Peter Loosen
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Paper Abstract

The authors present studies on laboratory-based spectroscopy in the extreme ultraviolet (EUV) performed on a variety of thin film materials. This work focuses on spectroscopic measurements of EUV reflectivity and transmittance at wavelengths between 10 nm and 15 nm. The presented applications of the technique include the reconstruction of optical constants for novel materials such as EUV photoresists and absorbers, the characterization of EUV pellicles and ultrathin layer systems as well as the characterization of nanostructured surfaces.

Paper Details

Date Published: 26 September 2019
PDF: 6 pages
Proc. SPIE 11147, International Conference on Extreme Ultraviolet Lithography 2019, 111471X (26 September 2019); doi: 10.1117/12.2536884
Show Author Affiliations
Lukas Bahrenberg, RWTH Aachen Univ. (Germany)
Sven Glabisch, RWTH Aachen Univ. (Germany)
Moein Ghafoori, RWTH Aachen Univ. (Germany)
Sascha Brose, RWTH Aachen Univ. (Germany)
Serhiy Danylyuk, RWTH Aachen Univ. (Germany)
Jochen Stollenwerk, RWTH Aachen Univ. (Germany)
Fraunhofer ILT (Germany)
Peter Loosen, RWTH Aachen Univ. (Germany)
Fraunhofer ILT (Germany)


Published in SPIE Proceedings Vol. 11147:
International Conference on Extreme Ultraviolet Lithography 2019
Toshiro Itani; Paolo A. Gargini; Patrick P. Naulleau; Kurt G. Ronse, Editor(s)

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