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Proceedings Paper

Preparation of MoS2 films for sensor applications
Author(s): Bartłomiej Stonio; Piotr Firek; Andrzej Taube; Jan Szmidt
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Paper Abstract

The paper presents a method of producing single layers of molybdenum disulphide on silicon substrates covered with a layer of 275nm silicon dioxide produced by means of thermal oxidation. MoS2 was obtained using the CVD (Chemical Vapor Deposition) technique, and the process parameters were the heating temperatures of the substrates - sulfur and molybdenum oxide, the carrier gas flow in the reactor and the deposition time. Subsequently, the obtained layers were characterized using optical microscopy, atomic force microscopy and Raman spectroscopy. The obtained parameters of layers allow in the future to use them in sensory techniques.

Paper Details

Date Published: 6 November 2019
PDF: 7 pages
Proc. SPIE 11176, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2019, 1117656 (6 November 2019); doi: 10.1117/12.2536814
Show Author Affiliations
Bartłomiej Stonio, Warsaw Univ. of Technology (Poland)
Piotr Firek, Warsaw Univ. of Technology (Poland)
Andrzej Taube, Warsaw Univ. of Technology (Poland)
Jan Szmidt, Warsaw Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 11176:
Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2019
Ryszard S. Romaniuk; Maciej Linczuk, Editor(s)

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