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Proceedings Paper

Low reflection phase shift mask for high resolution flat panel displays
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Paper Abstract

In recent years, as represented by smart phone and head mounted device, high definition displays have been rapidly developed, and the importance of phase shift mask (PSM) to resolve high definition patterns is increasing. However, since the conventional PSM has high reflection characteristic, high reflection of PSM causes large line width distribution due to the influence of the standing wave on the resist pattern, which hinders the formation of high definition patterns. We have developed PSM with low reflectivity by using Cr and MoSi material. It has been confirmed that the developed PSM blanks show significant low reflection characteristics.

Paper Details

Date Published: 26 September 2019
PDF: 6 pages
Proc. SPIE 11148, Photomask Technology 2019, 1114817 (26 September 2019); doi: 10.1117/12.2536624
Show Author Affiliations
Narihiro Morosawa, ULVAC Coating Corp. (Japan)
Eiji Shiozaki, ULVAC Coating Corp. (Japan)
Kagehiro Kageyama, ULVAC Coating Corp. (Japan)

Published in SPIE Proceedings Vol. 11148:
Photomask Technology 2019
Jed H. Rankin; Moshe E. Preil, Editor(s)

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