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Proceedings Paper

Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer
Author(s): Ayako Nakajima; Manabu Hoshino; Kazunori Taguchi; Takahiro Kozawa
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Paper Abstract

We developed novel resist materials and developer with fluorine atoms. Fluorine expected to show higher absorption coefficient than carbon because of its higher atomic number. From QCM, GPC, and SEM evaluation, it was found that ZEP-Y1 and ZEP-Y2 have a potential for next generation resist materials. The combination of resist material including fluorine atoms and fluorine solution is promising. This study showed the possibility of the extension of range for resist materials and developers.

Paper Details

Date Published: 26 September 2019
PDF: 6 pages
Proc. SPIE 11148, Photomask Technology 2019, 1114814 (26 September 2019); doi: 10.1117/12.2536526
Show Author Affiliations
Ayako Nakajima, Osaka Univ. (Japan)
Manabu Hoshino, Zeon Corp. (Japan)
Kazunori Taguchi, Zeon Corp. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 11148:
Photomask Technology 2019
Jed H. Rankin; Moshe E. Preil, Editor(s)

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