Share Email Print
cover

Proceedings Paper • new

Novel cleaning technology for nanoparticle removal
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

It’s generally said that the management of particles is important. In DUV lithography, it’s needed to remove particles on photomask surface not to induce patterning defects on wafer. Moreover, in Nanoimprint lithography (NIL), particles on template cause not only patterning defects on wafer but also its own pattern collapse. Therefore, these particles have to be entirely removed from substrate surface with cleaning technology. In this paper, we proposed ‘Freeze Cleaning’ which has more than 99% PRE for 40nm SiN standard nanoparticle without pattern collapse and critical dimension (CD) shift. And it was also demonstrated that soft defects on template which remained after conv. cleaning could be removed with Freeze Cleaning. These results predict that Freeze Cleaning will contribute to progress of photomask and template technology to next stage.

Paper Details

Date Published: 29 September 2019
PDF: 8 pages
Proc. SPIE 11148, Photomask Technology 2019, 111480N (29 September 2019); doi: 10.1117/12.2536471
Show Author Affiliations
Mana Tanabe, Toshiba Memory Corp. (Japan)
Kosuke Takai, Toshiba Memory Corp. (Japan)
Kyo Otsubo, Toshiba Memory Corp. (Japan)
Kaori Umezawa, Toshiba Memory Corp. (Japan)
Minako Iinuma, Toshiba Memory Corp. (Japan)
Hideaki Sakurai, Toshiba Memory Corp. (Japan)
Shingo Kanamitsu, Toshiba Memory Corp. (Japan)


Published in SPIE Proceedings Vol. 11148:
Photomask Technology 2019
Jed H. Rankin; Moshe E. Preil, Editor(s)

© SPIE. Terms of Use
Back to Top