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Influence of ultra-sonic frequency during substrate cleaning on the laser resistance of antireflection coatings
Author(s): Thomas Gischkat; Daniel Schachtler; Zoltan Balogh-Michels; Roelene Botha; André Mocker; Bernd Eiermann; Sven Günther
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Paper Abstract

Cleaning of substrates prior to optical coating is an important step in the manufacturing of high performance optical components. It is well known that the ultra-sonic frequency used during substrate cleaning has a strong influence on the quality of the cleaning process and the number of remaining particles on the surface. Therefore, we have investigated the influence of ultra-sonic frequency during substrate cleaning on the laser resistance of antireflection coatings. For this purpose, a SiO2 / Ta2O5 AR-coating for a normal angle of incidence at 1064 nm was deposited onto fused silica substrates. Prior to deposition, the substrates were cleaned with cleaning processes. The applied ultra-sonic frequencies were 40, 80, 120 and 500 kHz. After deposition the LIDT was measured using a 1064 nm ns-pulsed laser test bench. It turned out that the different ultra-sonic-cleaning processes have a strong influence on the number of remaining particles on the surface of the cleaned samples. The counted number of particles with sizes greater < 83 nm were between 1320 and 12 particles for the different applied ultra-sonic frequencies. In consequence the different cleaned and AR-coated samples show different laser damage behavior. Nevertheless the measured particle density does not totally explain the differences in laser resistance.

Paper Details

Date Published: 20 November 2019
PDF: 8 pages
Proc. SPIE 11173, Laser-induced Damage in Optical Materials 2019, 1117317 (20 November 2019); doi: 10.1117/12.2536442
Show Author Affiliations
Thomas Gischkat, Rhysearch (Switzerland)
Daniel Schachtler, Rhysearch (Switzerland)
Zoltan Balogh-Michels, Rhysearch (Switzerland)
Roelene Botha, Rhysearch (Switzerland)
NTB Interstate Univ. of Applied Sciences (Switzerland)
André Mocker, NTB Interstate Univ. of Applied Sciences (Switzerland)
Bernd Eiermann, WZW-Optic AG (Switzerland)
Sven Günther, WZW-Optic AG (Switzerland)
Ultrasonic Cleaning Machines AG (Ultrasonic Cleaning Machines AG)


Published in SPIE Proceedings Vol. 11173:
Laser-induced Damage in Optical Materials 2019
Christopher Wren Carr; Vitaly E. Gruzdev; Detlev Ristau; Carmen S. Menoni, Editor(s)

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