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Silicone grating fabricated using photoresist mold
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Paper Abstract

We fabricated a transmission silicone grating using two-beam interference method and imprint lithography, and evaluated its optical characteristics during a compression process. The grating pattern with ~0.4 μm depth and 1 μm pitch was created on a silicone surface by imprinting process with a photoresist mold to realize a simple, low-cost fabrication process. The first order diffraction transmittance of this grating reached ~10% at 633 nm wavelength. We also measured the relationship between the grating period and compressive stress to the fabricated elements. The grating period changed from 1 μm to ~0.8 μm by ~17% compression of the fabricated element in one direction, perpendicular to the grooves.

Paper Details

Date Published: 15 November 2019
PDF: 5 pages
Proc. SPIE 11175, Optifab 2019, 111751Y (15 November 2019); doi: 10.1117/12.2535713
Show Author Affiliations
Itsunari Yamada, Setsunan Univ. (Japan)
Yusuke Ikeda, Univ. of Shiga Prefecture (Japan)


Published in SPIE Proceedings Vol. 11175:
Optifab 2019
Blair L. Unger; Jessica DeGroote Nelson, Editor(s)

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