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Proceedings Paper

Improvements of diffractive optical element uniformity and zero order performance using lithographic process parameter optimization method
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Paper Abstract

Diffractive optical elements developed based on divergent light illumination enable a much broader range of applications compared to those designed based on plane wave approximation model. This is due to their easier module process, lower mass production cost and higher integration reliability. Multi-level phase stages and small design resolution are essential to achieve good design properties, but on the contrary, they increase the complication of simulation and fabrication and hence the gap between them. In this paper, a design performance approaching method using lithography process parameter optimization is proposed and verified in both simulation and fabrication. This method is firstly reported and systematically analyzed in this paper to our knowledge. Basing on 22°*22° divergent light illumination model, a 9*9 spot array pattern with diagonal Field of View 72.34° was designed with eight level phase stages ranging from 0 to 7π/4. Master wafers were fabricated through repeatable stepper lithography and plasma dry etch. Nano-imprinting (NIL) was implemented to duplicate DOE samples. DOE uniformity has been improved from 110.6.% to 90.9.% through process parameters optimization, with better center zero order intensity observed. It’s most probably due to the optimization of phase stage shift from the pattern mis-order in fabrication process. This work provides a new metrology for DOE’s design and fabrication, and is helpful to reduce the overall research and development cost.

Paper Details

Date Published: 18 November 2019
PDF: 9 pages
Proc. SPIE 11188, Holography, Diffractive Optics, and Applications IX, 111880X (18 November 2019); doi: 10.1117/12.2535466
Show Author Affiliations
Guowei Zhang Sr., Xi'an Jiaotong Univ. (China)
Beijing Yuguang Technology Development Co., Ltd. (China)
Xiaodong Yin Sr., Beijing Yuguang Technology Development Co., Ltd. (China)
Kehan Tian Sr., Beijing Yuguang Technology Development Co., Ltd. (China)


Published in SPIE Proceedings Vol. 11188:
Holography, Diffractive Optics, and Applications IX
Yunlong Sheng; Changhe Zhou; Liangcai Cao, Editor(s)

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