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Proceedings Paper

EUV reticle defectivity protection options
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Paper Abstract

EUV pellicles have been enabled to provide customers with defect protection for EUV reticles. However, due to the absorption that is much higher than for DUV pellicles, using the pellicle has certain disadvantages. Most significant is the reduction in throughput caused by the absorption of EUV photons in the pellicle. This leads to a customer decision to use a pellicle and accept the reduced throughput, or to not use a pellicle and have additional inspection steps to check the cleanliness of the EUV reticle. These tradeoffs vary by customer and use case. This study addresses the balance of factors for using or not using a pellicle through a cost comparison.

Paper Details

Date Published: 10 October 2019
PDF: 11 pages
Proc. SPIE 11148, Photomask Technology 2019, 111480Y (10 October 2019); doi: 10.1117/12.2535396
Show Author Affiliations
Michael Lercel, ASML (United States)
Christophe Smeets, ASML (Netherlands)
Mark van der Kerkhof, ASML (Netherlands)
Amo Chen, ASML (Netherlands)
Tjarko van Empel, ASML (Netherlands)
Vadim Banine, ASML (Netherlands)

Published in SPIE Proceedings Vol. 11148:
Photomask Technology 2019
Jed H. Rankin; Moshe E. Preil, Editor(s)

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