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Proceedings Paper

Influence of the dose assignment and fracturing type on patterns exposed by a variable shaped e-beam writer: simulation vs experiment
Author(s): Varvara Brackmann; Michael Friedrich; Clyde Browning; Norbert Hanisch; Benjamin Uhlig
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Paper Abstract

The result of electron beam lithography is influenced by many effects: forward and backward scattering, formation of secondary electrons, re-scattering of electrons, chemicals diffusion in the resist material, wafer stack, etc. To achieve high resolution all these effects should be taken into account. Commonly, the electron energy distribution in the exposed matter is described by the Point Spread Function (PSF). This is a simple approach which takes into account large portion of phenomena using few parameters. PSF function is a Gauss or multiple Gauss function, which is determined experimentally by the calibration procedure. Each resist material with corresponding stack is characterised by its own PSF, in case of double Gaussian, with the following parameters: α, β and η. In the current work the PSF parameters were systematically varied to study their influence on the dose assignment and resulting pattern. This gives a broader understanding of the correction mechanism using PSF. Furthermore, the resulting shape of the structure is influenced not only by the PSF parameters and dose assignment, but by the fracturing type as well. All these effects were studied using experimental and simulation approaches.

Paper Details

Date Published: 29 August 2019
PDF: 10 pages
Proc. SPIE 11177, 35th European Mask and Lithography Conference (EMLC 2019), 1117713 (29 August 2019); doi: 10.1117/12.2534642
Show Author Affiliations
Varvara Brackmann, Fraunhofer Institute for Photonic Microsystems (Germany)
Michael Friedrich, Fraunhofer Institute for Photonic Microsystems (Germany)
Clyde Browning, ASELTA Nanographics (France)
Norbert Hanisch, Fraunhofer Institute for Photonic Microsystems (Germany)
Benjamin Uhlig, Fraunhofer Institute for Photonic Microsystems (Germany)

Published in SPIE Proceedings Vol. 11177:
35th European Mask and Lithography Conference (EMLC 2019)
Uwe F.W. Behringer; Jo Finders, Editor(s)

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