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Proceedings Paper

Lithographic effects due to particles on high-NA EUV mask pellicle
Author(s): Lokesh Devaraj; Gerardo Bottiglieri; Andreas Erdmann; Felix Wählisch; Michiel Kupers; Eelco van Setten; Timon Fliervoet
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Paper Abstract

Defectivity in EUV scanners gains much more importance as they move towards the high-volume manufacturing. The reticle (mask) needs to be protected from particle contamination, both inside and outside the scanner environment. One widely used method to realize this is to make use of a thin protective layer on top of the mask, which is called pellicle. In this work we investigate the impact on printed features caused by particles laying on top of the pellicle for a High-NA EUV scanner. The study was supported by simulations using the most up to date High-NA EUV scanner projected design. The most relevant lithographic metrics (namely, change in Critical Dimension, Normalized Intensity Log Slope, dose sensitivity, non-Telecentricity, Pattern Shift and Mask Error Enhancement Factor) have been considered in the study. An experimentally calibrated simulation model is used to predict the particle transmission as function of the particle size. The goal is to set a well-reasoned (based on imaging requirements) maximum particle size specification for production of pellicles and cleanliness inspection. Some sets of mask patterns and sources (use cases) that likely will be used in high volume manufacturing are considered. Furthermore, a comparison with existing 0.33 NA EUV simulation results is done.

Paper Details

Date Published: 29 August 2019
PDF: 14 pages
Proc. SPIE 11177, 35th European Mask and Lithography Conference (EMLC 2019), 111770V (29 August 2019); doi: 10.1117/12.2534177
Show Author Affiliations
Lokesh Devaraj, ASML Netherlands B.V. (Netherlands)
Gerardo Bottiglieri, ASML Netherlands B.V. (Netherlands)
Andreas Erdmann, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Felix Wählisch, ASML Netherlands B.V. (Netherlands)
Michiel Kupers, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Timon Fliervoet, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 11177:
35th European Mask and Lithography Conference (EMLC 2019)
Uwe F.W. Behringer; Jo Finders, Editor(s)

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