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Proceedings Paper

Research on photomask process for FPD
Author(s): Kouichi Murakami; Takumi Uemura; Shuichi Ojima
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Paper Abstract

FSCE focused on resist materials and coordinate correction technology for FPD mask and carried out research on underlying technology. The results we obtained are reported.

Paper Details

Date Published: 27 June 2019
PDF: 4 pages
Proc. SPIE 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117805 (27 June 2019);
Show Author Affiliations
Kouichi Murakami, FSCE Inc. (Japan)
Takumi Uemura, Sojo Univ. (Japan)
Shuichi Ojima, Sojo Univ. (Japan)


Published in SPIE Proceedings Vol. 11178:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
Akihiko Ando, Editor(s)

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