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Proceedings Paper

Nanoscale isotopic imaging and trace analysis by extreme ultraviolet laser ablation mass spectrometry (Conference Presentation)

Paper Abstract

In EUV TOF MS, bright laser pulses from a compact 46.9-nm-wavelength laser [1] are focused into nanometer size spots to ablate craters a few nanometers deep on selected regions of the sample. Elemental and molecular ions in the laser-created plasma are extracted and identified by their mass-to-charge ratio (m/z) using a time-of-flight (TOF) mass spectrometer. Analysis of the spatially resolved mass spectra obtained as the sample is displaced with respect to the focused laser beam enables one to construct 3-D composition images with nanoscale resolution [2]. In this talk I will describe recent advances of extreme ultraviolet MSI that show its unique capabilities to identify low concentration of high Z elements into glass matrices, and to map isotopic ratios [3]. [1] S. Heinbuch et al, "Demonstration of a desk-top size high repetition rate soft x-ray laser," Opt. Express 13, 4050-4055 (2005). [2] I. Kuznetsov et al, "Three dimensional nanoscale molecular imaging by extreme ultraviolet laser ablation mass spectrometry, " Nature Communications, Vol. 6, Article No. 6944(2015). [3] T. Green, et al, “Characterization of extreme ultraviolet laser ablation mass spectrometry for actinide trace analysis and nanoscale isotopic imaging,” J. Analy. At. Spectrom. Vol. 32, 1092 (2017).

Paper Details

Date Published: 9 September 2019
Proc. SPIE 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII, 1111108 (9 September 2019); doi: 10.1117/12.2533354
Show Author Affiliations
Carmen S. Menoni, Colorado State Univ. (United States)
Lydia Rush, Colorado State Univ. (United States)
Ilya Kuznetsov, Colorado State Univ. (United States)
Andrew M. Duffin, Pacific Northwest National Lab. (United States)
Jorge J. Rocca, Colorado State Univ. (United States)

Published in SPIE Proceedings Vol. 11111:
X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII
Annie Klisnick; Carmen S. Menoni, Editor(s)

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