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Proceedings Paper

Fabrication of GaSb-based distributed Bragg reflector semiconductor lasers
Author(s): Cheng-Ao Yang; Sheng-Wen Xie; Yi Zhang; Jin-Ming Shang; Ye Yuan; Fu-Hui Shao; Shu-Shan Huang; Qing-Xuan Jia; Yu Zhang; Ying-Qiang Xu; Zhi-Chuan Niu
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Paper Abstract

We report on the fabrication of GaSb-based type-I quantum well distributed Bragg reflector (DBR) lasers operating in the 2-μm region. Second-order metallic gratings of chromium are patterned by electron beam lithography. The fabricated DBR lasers emit a single-mode continuous wave at 2.04 μm. The side mode suppression ratio (SMSR) is as high as 35dB with a narrow line-width of 37MHz. The devices show a stable single mode operation with current tuning rate of 0.006nm/mA.

Paper Details

Date Published: 17 May 2019
PDF: 5 pages
Proc. SPIE 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019), 111701A (17 May 2019); doi: 10.1117/12.2533003
Show Author Affiliations
Cheng-Ao Yang, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Sheng-Wen Xie, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Yi Zhang, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Jin-Ming Shang, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Ye Yuan, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Fu-Hui Shao, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Shu-Shan Huang, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Qing-Xuan Jia, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Yu Zhang, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Ying-Qiang Xu, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)
Zhi-Chuan Niu, Institute of Semiconductors (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 11170:
14th National Conference on Laser Technology and Optoelectronics (LTO 2019)
Jianqiang Zhu; Weibiao Chen; Zhenxi Zhang; Minlin Zhong; Pu Wang; Jianrong Qiu, Editor(s)

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