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Proceedings Paper

Initial polishing machine control model to determine target TIF depth on SiC mirror surfaces (Conference Presentation)
Author(s): Jeong-Yeol Han; Suyeon Cha; Dohoon Kim; Myung Cho

Paper Abstract

Due to the high toughness of SiC material, in general, the polishing time of a SiC mirror has been challenging to determine by optician. In the optical shop, optician normally enters input parameters into a polishing machine prior to polish out the mirror surface. The target surface removal rate, specified by an optician, are highly depending on polishing schedule. A very tight polishing schedule commonly thrusts adventurous larger target quantities on the optician. However, the target numbers should be determined by the reliability of relationships between the machine input parameter and output removal rate. In this paper, we introduce an initial model which can reliably suggest machine input parameters for polishing head. These parameters can control polishing processes to achieve the target TIF (Tool Influence Function) depth which is an unit polishing removal quantity on the SiC mirror optical surfaces.

Paper Details

Date Published: 10 September 2019
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Proc. SPIE 11101, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV, 111010A (10 September 2019);
Show Author Affiliations
Jeong-Yeol Han, Korea Astronomy and Space Science Institute (Korea, Republic of)
Suyeon Cha, Kyung Hee Univ. (Korea, Republic of)
Dohoon Kim, Green Optics Co., Ltd. (Korea, Republic of)
Myung Cho, National Optical Astronomy Observatory (United States)


Published in SPIE Proceedings Vol. 11101:
Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV
Matthias Kroedel; Bill A. Goodman, Editor(s)

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