Share Email Print

Proceedings Paper

Photo-ablation lithographic technique at 172 nm based upon flat excimer lamps (Conference Presentation)
Author(s): Andrey E. Mironov; Dane J. Sievers; Jinhong Kim; Sung-Jin Park; James G. Eden

Paper Abstract

Photolithographic techniques capable of producing sub-micron scale features typically involve laser or electron beam sources and chemical development of an exposed photoresist. We report here a novel, low cost photolithographic process utilizing flat, efficient lamps emitting at 172 nm. Recently developed 10 cm x 10 cm lamps, for example, produce more than 25 W of average power at 172 nm which enables the precise and fast patterning of most polymers, including those normally employed as e-beam resists and photoresists. Recent experiments demonstrate that PMMA films less than 100 nm in thickness are patterned in less than 20 s through a contact mask with high contrast resolution of 500 nm features. The ultimate resolution limit is expected to be ≤ 300 nm for a contact method. Electroplating technique was further used to deposit 500 nm gold features on a silicon substrate. The reported process does not require a photoresist development step and is performed in nitrogen atmosphere at atmospheric pressure which make it fast and affordable for fabrication facilities that have no access to high-tech photolithography equipment. Samples as large as 76 mm (3”) in diameter may be exposed with a single lamp in one step and areas of 1 m2 and above may be processed with tiled arrays of lamps. Patterning of bulk polymers (acrylic sheets, for example) through a photomask and subsequent formation of sub-micron features has also been demonstrated.

Paper Details

Date Published: 9 September 2019
Proc. SPIE 11086, UV and Higher Energy Photonics: From Materials to Applications 2019, 110860M (9 September 2019); doi: 10.1117/12.2529538
Show Author Affiliations
Andrey E. Mironov, Univ. of Illinois (United States)
Dane J. Sievers, Univ. of Illinois (United States)
Jinhong Kim, Univ. of Illinois (United States)
Sung-Jin Park, Univ. of Illinois (United States)
James G. Eden, Univ. of Illinois (United States)

Published in SPIE Proceedings Vol. 11086:
UV and Higher Energy Photonics: From Materials to Applications 2019
Gilles Lérondel; Yong-Hoon Cho; Atsushi Taguchi; Satoshi Kawata, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?