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Proceedings Paper

Large-scale flourine-doped textured transparent conducting SnO2 films deposited by APCVD
Author(s): Honglei Ma; Deheng Zhang; Youpeng Chen; Shuying Li; Jin Ma; Fujian Zong
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Paper Abstract

Large scale (30 by 30 cm) transparent conducting F-doped textured SnO2 films have been prepared by atmosphere pressure chemical vapor deposition (APCVD). Uniformly polycrystalline SnO2:F films having a variable preferred orientation have been obtained with resistivity as low as 5 multiplied by 10-4 (Omega) cm, with carrier concentrations between 3.5 multiplied by 1020 and 7 multiplied by 1020 cm-3 and Hall mobilities from 15.7 to 20.1 cm2 V/s. The average transmittance (including diffusion transmittance) is higher than 90% in the wavelength range of the visible spectrum and the maximum infrared reflectance reaches 92% for a film 655 nm thick. Substrate temperature, fluorine flow rate are main parameters affecting sheet resistance and transmittance of the resulting films. Oxygen flow rate also influences the film quality in some extent.

Paper Details

Date Published: 3 October 1996
PDF: 9 pages
Proc. SPIE 2897, Electro-Optic and Second Harmonic Generation Materials, Devices, and Applications, (3 October 1996); doi: 10.1117/12.252947
Show Author Affiliations
Honglei Ma, Shandong Univ. (China)
Deheng Zhang, Shandong Univ. (China)
Youpeng Chen, Shandong Univ. (China)
Shuying Li, Shandong Univ. (China)
Jin Ma, Shandong Univ. (China)
Fujian Zong, Shandong Univ. (China)

Published in SPIE Proceedings Vol. 2897:
Electro-Optic and Second Harmonic Generation Materials, Devices, and Applications
Manfred Eich; Bruce H. T. Chai; Minhua Jiang, Editor(s)

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