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Proceedings Paper

The Optical Metrology Laboratory at Diamond: pushing the limits of nano-metrology

Paper Abstract

We present recent advancements in the Optical Metrology Laboratory (OML) at Diamond Light Source. Improvements in optical manufacturing technology, and demands from beamlines at synchrotron and free electron laser facilities, have made it a necessity to routinely characterize X-ray mirrors with slope errors < 100 nrad rms. The Diamond-NOM profiler can measure large, fully assembled optical systems in a sideways, upwards, or downwards facing geometry. Examples are provided of how it has recently characterized several challenging systems, including: actively bent mirrors; clamped monochromator gratings in a downward-facing geometry; and four, state-of-the-art, elliptically bent, long mirrors with slope errors < 100 nrad rms. The NOM’s components and data analysis procedures are continuously updated to stay ahead of the ever-increasing quality of X-ray optics and opto-mechanics. The OML’s newest instrument is a Zygo HDX 6” Fizeau interferometer. A dedicated support frame and motorized translation and rotation stages enable sub-aperture images to be stitched together using in-house controls and automation software. Cross-comparison of metrology data, including as part of the MooNpics collaboration, provides a valuable insight into the nature of optical defects and helps to push optical fabrication to a new level of quality.

Paper Details

Date Published: 9 September 2019
PDF: 10 pages
Proc. SPIE 11109, Advances in Metrology for X-Ray and EUV Optics VIII, 1110906 (9 September 2019); doi: 10.1117/12.2529401
Show Author Affiliations
Ioana-Theodora Nistea, Diamond Light Source Ltd. (United Kingdom)
Simon G. Alcock, Diamond Light Source Ltd. (United Kingdom)
Murilo Bazan da Silva, Diamond Light Source Ltd. (United Kingdom)
Kawal Sawhney, Diamond Light Source Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 11109:
Advances in Metrology for X-Ray and EUV Optics VIII
Lahsen Assoufid; Haruhiko Ohashi; Anand Asundi, Editor(s)

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