Proceedings Paper
Novel UV line beam system for large area processing with 248 nm (Withdrawal Notice)
Paper Abstract
Publisher’s Note: This conference presentation and paper, originally published on 9 September 2019, was withdrawn on 13 May 2020 per author request.
Paper Details
Date Published: 9 September 2019
PDF: 1 pages
Proc. SPIE 11105, Novel Optical Systems, Methods, and Applications XXII, 1110502 (9 September 2019); doi: 10.1117/12.2529261
Published in SPIE Proceedings Vol. 11105:
Novel Optical Systems, Methods, and Applications XXII
Cornelius F. Hahlweg; Joseph R. Mulley, Editor(s)
PDF: 1 pages
Proc. SPIE 11105, Novel Optical Systems, Methods, and Applications XXII, 1110502 (9 September 2019); doi: 10.1117/12.2529261
Show Author Affiliations
Matthias Trenn, Fraunhofer-Institut für Lasertechnik ILT (Germany)
Ralph Delmdahl, Coherent LaserSystems GmbH & Co. KG (Germany)
Ralph Delmdahl, Coherent LaserSystems GmbH & Co. KG (Germany)
Patrick Sperling, Fraunhofer-Institut für Lasertechnik ILT (Germany)
Published in SPIE Proceedings Vol. 11105:
Novel Optical Systems, Methods, and Applications XXII
Cornelius F. Hahlweg; Joseph R. Mulley, Editor(s)
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