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Novel UV line beam system for large area processing with 248 nm
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Paper Abstract

In large-scale production, reducing the processing time while maintaining high precision is of crucial importance in order to reduce production cost and guarantee high quality. To achieve this aim, a line beam system combined with a 150 W excimer laser is introduced. UV excimer laser radiation has proven itself for precise structuring and modifying of microand nanometer-scale layers. With a wavelength of 248 nm, materials can be selectively modified with a depth resolution below 0.1 micrometers. Due to the latest technical development, high power excimer laser bridges the gap between high precision and cost-efficient processing.

The linear beam concept dispenses with movable components such as scanner optics. By using a fixed line beam with ns pulse duration, a system with optimum reproducibility has been created. The functionality of the novel line beam system and the attainable layer quality are evaluated individually and form the basis for rapidly implementing the UV system in industrial applications. One application example presented in this paper is the reduction of graphene oxide for waferscale fabrication of reduced graphene oxide.

Paper Details

Date Published: 9 September 2019
PDF: 7 pages
Proc. SPIE 11105, Novel Optical Systems, Methods, and Applications XXII, 1110502 (9 September 2019); doi: 10.1117/12.2529261
Show Author Affiliations
Matthias Trenn, Fraunhofer-Institut für Lasertechnik ILT (Germany)
Ralph Delmdahl, Coherent LaserSystems GmbH & Co. KG (Germany)
Patrick Sperling, Fraunhofer-Institut für Lasertechnik ILT (Germany)


Published in SPIE Proceedings Vol. 11105:
Novel Optical Systems, Methods, and Applications XXII
Cornelius F. Hahlweg; Joseph R. Mulley, Editor(s)

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