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Proceedings Paper

Measurement of patterned surfaces with non-fluorescent structured illumination microscope
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Paper Abstract

Patterned surfaces which include semiconductor devices, optical components and other functional surfaces play important role in recent manufacturing. Optical measurements with non-destructive property is available for them but further improvement in spatial resolution and throughput are necessary. In this study, structured illumination microscopy was employed for high-resolution wide-field measurement. Structured illumination microscopy has been usually applied for fluorescent bio-imaging. For non-fluorescent imaging and industrial applications, one problem is speckle noise in structured illumination generation and another problem is vibration and thermal drift in high-precision positioning of laser-interference standing-wave illumination. In our development, the phase of the structured illumination is detected as a fringe signal with another interferometric measurement system, which is employed by structured illumination microscopy as originally developed; it uses a low-coherence light source for high-resolution and low-speckle imaging. We constructed an optical system consisting of plural Michelson interferometers, which allow the low-coherence interference fringes to be manipulated on a sample and the phase to be detected on another sensor. Feeding back the phase of structured illumination through super-resolution processing allows robust imaging despite vibrations, drifting, and environmental changes. A series of experiments were performed to verify our developed microscope system applied for measurement of patterned surfaces.

Paper Details

Date Published: 3 September 2019
PDF: 6 pages
Proc. SPIE 11102, Applied Optical Metrology III, 111021L (3 September 2019); doi: 10.1117/12.2529023
Show Author Affiliations
S. Usuki, Shizuoka Univ. (Japan)
G. Shibata, Shizuoka Univ. (Japan)
Kenjiro T. Miura, Shizuoka Univ. (Japan)

Published in SPIE Proceedings Vol. 11102:
Applied Optical Metrology III
Erik Novak; James D. Trolinger, Editor(s)

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