Proceedings Paper
First demonstration of a 331-beam SEM| Format | Member Price | Non-Member Price |
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Paper Abstract
We have demonstrated the successful operation of a multi-beam scanning electron microscope with 331 electron beams for the first time. This makes it the world’s fastest SEM. The underlying architecture of the existing multi-beam mSEM technology fully supports the scale-up of the number of electron beams to 331. Scaling beyond this number is feasible.
Paper Details
Date Published: 26 March 2019
PDF: 5 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095931 (26 March 2019); doi: 10.1117/12.2528795
Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)
PDF: 5 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095931 (26 March 2019); doi: 10.1117/12.2528795
Show Author Affiliations
C. Riedesel, Carl Zeiss Microscopy GmbH (Germany)
I. Müller, Carl Zeiss Microscopy GmbH (Germany)
N. Kaufmann, Carl Zeiss Microscopy GmbH (Germany)
A. Adolf, Carl Zeiss Microscopy GmbH (Germany)
I. Müller, Carl Zeiss Microscopy GmbH (Germany)
N. Kaufmann, Carl Zeiss Microscopy GmbH (Germany)
A. Adolf, Carl Zeiss Microscopy GmbH (Germany)
N. Kämmer, Carl Zeiss Microscopy GmbH (Germany)
H. Fritz, Carl Zeiss Microscopy GmbH (Germany)
A. L. Eberle, Carl Zeiss Microscopy GmbH (Germany)
D. Zeidler, Carl Zeiss Microscopy GmbH (Germany)
H. Fritz, Carl Zeiss Microscopy GmbH (Germany)
A. L. Eberle, Carl Zeiss Microscopy GmbH (Germany)
D. Zeidler, Carl Zeiss Microscopy GmbH (Germany)
Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)
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