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Proceedings Paper

Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance
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Paper Abstract

Reducing the reflection of silicon surface is an effective way to enhance its optical absorption performance in optical and optoelectronic devices. In this paper, the influence mechanism of heat accumulation effect existing in the material substrate on the multi-scale porosity properties of surface structure during femtosecond laser irradiation is investigated. Micro-nano structures will lose their multi-scale porous properties at high-repetition-rate laser irradiation due to excessive agglomeration, nucleation or melting. By rapidly cooling the material substrate, the porosity of surface micro-nano structure are optimized, and the antireflection performance of the material surface is improved obviously. Our study opens a novel and convenient route for preparation of broadband antireflective black silicon surfaces for various applications.

Paper Details

Date Published: 30 August 2019
PDF: 8 pages
Proc. SPIE 11101, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV, 111010C (30 August 2019);
Show Author Affiliations
Tong Chen, Xi'an Jiaotong Univ. (China)
Wenjun Wang, Xi'an Jiaotong Univ. (China)
Tao Tao, Xi'an Jiaotong Univ. (China)
Xuesong Mei, Xi'an Jiaotong Univ. (China)
Aifei Pan, Xi'an Jiaotong Univ. (China)


Published in SPIE Proceedings Vol. 11101:
Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems IV
Matthias Kroedel; Bill A. Goodman, Editor(s)

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