As a summary of of the authors' previous paper of Ref 1, we describe a new scheme of a Linnik interferometric configuration based on spectrally-resolved white-light interferometry for simultaneous measurement of top surface and its underlying film surfaces in multilayer film structure. Our proposed technique enables accurate measurements of the phase and reflectance over a large range of wavelengths using the iterative least-squares phase-shifting algorithm by suppressing critical phase shift errors, and it provides a better measurement result than conventional methods. To verify our method a complex multilayer film was prepared and we measured it, and compared with well-known conventional techniques. Comparison results show our new method successfully works well with high precision as same as existing methods.

Date Published: 21 June 2019
PDF: 5 pages
Proc. SPIE 11056, Optical Measurement Systems for Industrial Inspection XI, 1105631 (21 June 2019); doi: 10.1117/12.2527587

Published in SPIE Proceedings Vol. 11056:
Optical Measurement Systems for Industrial Inspection XI
Peter Lehmann; Wolfgang Osten; Armando Albertazzi Gonçalves Jr., Editor(s)