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Proceedings Paper

Bright high harmonic generation around 30 nm and 10 nm for seeding full coherent XFEL
Author(s): Zhiyuan Lou; Yinghui Zheng; Luyao Zhang; Jiaqi Wu; Zhinan Zeng; Ruxin Li; Zhizhan Xu
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Paper Abstract

We have generated soft X-ray pulses at the wavelength around 30 nm and 10 nm using high-order harmonic generation (HHG) in Ar and Ne gas targets respectively with low repetition rates, hundred-terawatt-level laser system in Shanghai Institute of Optics and Fine Mechanics (SIOM). The shortest wavelength of our generated harmonics is 9.8 nm at the 81th harmonic with the Ne gas target. Around the wavelength of 13 nm, the output energy of the 59th harmonic (13.5 nm) and the 61th harmonic (13.1 nm) reaches 10 nJ per pulse. This highly coherent extreme ultraviolet (XUV) source can be served as a potential seed for the free-electron laser (XFEL) with the method of laser wakefield acceleration (LWFA). Moreover, the 13 nm HHG source can be applied to coherent diffraction imaging (CDI) and XUV lithography.

Paper Details

Date Published: 21 June 2019
PDF: 6 pages
Proc. SPIE 11056, Optical Measurement Systems for Industrial Inspection XI, 110562M (21 June 2019);
Show Author Affiliations
Zhiyuan Lou, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Yinghui Zheng, Shanghai Institute of Optics and Fine Mechanics (China)
Luyao Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Jiaqi Wu, Shanghai Institute of Optics and Fine Mechanics (China)
ShanghaiTech Univ. (China)
Zhinan Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Ruxin Li, Shanghai Institute of Optics and Fine Mechanics (China)
ShanghaiTech Univ. (China)
Zhizhan Xu, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 11056:
Optical Measurement Systems for Industrial Inspection XI
Peter Lehmann; Wolfgang Osten; Armando Albertazzi Gonçalves Jr., Editor(s)

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