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EUV mask feature reconstruction via phase retrieval
Author(s): Paolo Ansuinelli; Wim Coene; Paul Urbach
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Paper Abstract

EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to assess the performance of coherent diffractive imaging (CDI) and related phase retrieval methods for the reconstruction of non-trivially shaped and a–periodic nanostructures from far field intensity data.

Paper Details

Date Published: 3 September 2019
PDF: 7 pages
Proc. SPIE 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI, 110892F (3 September 2019); doi: 10.1117/12.2525976
Show Author Affiliations
Paolo Ansuinelli, Delft Univ. of Technology (Netherlands)
Wim Coene, Delft Univ. of Technology (Netherlands)
ASML Netherlands B.V. (Netherlands)
Paul Urbach, Delft Univ. of Technology (Netherlands)


Published in SPIE Proceedings Vol. 11089:
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI
Balaji Panchapakesan; André-Jean Attias, Editor(s)

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