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Vectorial modeling for the image formation of a high-numerical-aperture Mueller-matrix ellipsometer
Author(s): Cai Wang; Chao Chen; Xiuguo Chen; Shiyuan Liu
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Paper Abstract

We have recently developed a high-numerical-aperture (high-NA) Mueller-matrix ellipsometer (MME). By adopting a high-NA objective lens, the scattered light can be collected and the image with high lateral resolution is acquired to obtain the spatially resolved Mueller matrix of the sample. In this manuscript, we propose a model of the image formation of the high-NA MME based on the rigorous coupled-wave analysis (RCWA) and vector diffraction theory. The proposed imaging formation model consists of four parts: scattering on the sample, collecting by the optical system, propagating in the optical system, and imaging on the image plane. Each part can be modeled and calculated separately. Utilizing the proposed model, we have performed a numerical simulation for two types of gratings. The results reveal the potential of the proposed model in predicting the measured Mueller matrix and analyzing the sensitivity of the high-NA MME to different nanostructures.

Paper Details

Date Published: 21 June 2019
PDF: 8 pages
Proc. SPIE 11057, Modeling Aspects in Optical Metrology VII, 110570Q (21 June 2019); doi: 10.1117/12.2525944
Show Author Affiliations
Cai Wang, Huazhong Univ. of Science and Technology (China)
Chao Chen, Huazhong Univ. of Science and Technology (China)
Xiuguo Chen, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 11057:
Modeling Aspects in Optical Metrology VII
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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