Laser radiation for a high precision measurement such as nanostructure measurement needed to be clean of wavefront aberrations. However, only expensive lasers with stabilization can achieve such robust parameters. The emission is needed to be corrected via adaptive optics. Nevertheless, high precision measurement of wavefront aberrations is necessary to high precision correction. The present work is dedicated to the problem of computer-generated Fourier holograms application for measurement of optical wavefront curvature with high precision. Mathematical modeling and experimental results of the method with the comparison of different approaches are presented.

Date Published: 21 June 2019
PDF: 7 pages
Proc. SPIE 11056, Optical Measurement Systems for Industrial Inspection XI, 1105629 (21 June 2019); doi: 10.1117/12.2525719

Published in SPIE Proceedings Vol. 11056:
Optical Measurement Systems for Industrial Inspection XI
Peter Lehmann; Wolfgang Osten; Armando Albertazzi Gonçalves Jr., Editor(s)